The Coordinator, University of Minho, established in Braga, Portugal

represented by José P. B. Silva

National Institute of Materials Physics, established in Magurele, Romania

represented by Corneliu Ghica

Ecole Centrale de Lyon, established in Ecully, France

represented by Bertrand Vilquin

External Advisory Board

Prof. Judith MacManus-Driscoll, Professor in the Materials Science at the University of Cambridge. She is also Royal Academy of Engineering Chair in Emerging Technologies. She is fellow of IOP, IOM3, WES, APS, MRS, and the Royal Academy of Engineering. She research work is in the area of oxide thin film engineering for low power IT and energy devices. She is interested in both understanding of basic functionalities and in engineering new interfacial-driven properties. For this purpose, she designs, fabricates and analyses novel nanostructured films.

Dr. Stéphane Monfray is currently a Principal Engineer with STMicroelectronics and an expert in advanced technologies. He is also the author or coauthor of more than 130 publications and received the Grand Prix of electronics General Ferrié in 2012. He has over ten years of experience on advanced CMOS technologies.

Rosa João Dias, is the Ecosystem Manager of the Corroios Competence Center (CoC) for Electric Mobility, located at the Corroios Production Unit. This CoC is responsible for the Innovation and Development of Heavy Vehicle Electric Mobility for Siemens AG. He has a degree in Electrical Engineering and Computer Science and an MBA from Nova SBE and Universidade Católica.
He started his career in the laboratories of the national network (EDP Labelec), having later worked on protection relays for substations and on the Smartgrid initiative.
He has deep technical and market knowledge in the Electric Mobility Area.

Newsletters

Newsletter 1 : November 2022

Newsletter 2 : March 2023

Newsletter 3 : September 2023

Newsletter 4 : April 2024

Publications

8. T. Song, V. Lenzi, J. P. B. Silva, L. Marques, I. Fina, F. Sánchez, “Disentangling stress and strain effects in ferroelectric HfO2”, Appl. Phys. Rev. 10, 041415 (2023). DOI : 10.1063/5.0172259

7. A. R. Jayakrishnan, B. A. Anju, S. K. P. Nair, S. Dutta, J. P.B. Silva, “Recent development of lead-free relaxor ferroelectric and antiferroelectric thin films as energy storage dielectric capacitors” Journal of the European Ceramic Society (2024). DOI: 10.1016/j.jeurceramsoc.2024.02.016

6. R. M.P. Pereira, M. C. Istrate, F. G. Figueiras, V. Lenzi, B. M. Silva, M. Benamara, K. N. Romanyuk, C. Ghica, B. G. Almeida, L. Marques, M. Pereira, J. P.B. Silva, “Phase transitions in ferroelectric ZrO2 thin films”, Materials Science in Semiconductor Processing 172,  108102 (2023). DOI: 10.1016/j.mssp.2023.108102

5. J. P. B. Silva et al., “Roadmap on ferroelectric hafnia- and zirconia-based materials and devices”, APL Mater 11, 089201 (2023). DOI : 10.1063/5.0148068

4. A. P. S. Crema, M. C. Istrate, A. Silva, V. Lenzi, L. Domingues, M. O. Hill, V. S. Teodorescu, C. Ghica, M. J. M. Gomes, M. Pereira, L. Marques, J. L. MacManus-Driscoll, J. P. B. Silva, Ferroelectric orthorhombic ZrO2 thin films achieved through nanosecond laser annealing” Advanced Science 10, 2207390 (2023). DOI: 10.1002/advs.20220739

3. A. Silva, I. Fina, F. Sánchez, J. P. B. Silva, L. Marques, V. Lenzi, “Unraveling the ferroelectric switching mechanisms in ferroelectric pure and La doped HfO2 epitaxial thin films”, Materials Today Physics 34,  101064 (2023). DOI: 10.1016/j.mtphys.2023.101064

2. J. P.B. Silva, M. C. Istrate, M. Hellenbrand, A. Jan, M. T. Becker, J.anna Symonowicz e, Fábio G. Figueiras f, V. Lenzi, M. O. Hill, C. Ghica, K. N. Romanyuk, M. J.M. Gomes, G. Di Martino, L. Marques, J. L. MacManus-Driscoll, “Ferroelectricity and negative piezoelectric coefficient in orthorhombic phase pure ZrO2 thin films”, Applied Materials Today 30, 101708 (2023). DOI: 10.1016/j.apmt.2022.101708

1. V. Lenzi, J. P. B. Silva, B. Šmíd, V. Matolín, C. M. Istrate, C. Ghica, J. L. MacManus-Driscoll, L. Marques, “Ferroelectricity induced by oxygen vacancies in rhombohedral ZrO2 thin films” Energy & Environmental Materials (2022), In press. https://onlinelibrary.wiley.com/doi/abs/10.1002/eem2.12500. (IF:13.443; Q1)

Conference presentations and proceedings

12. A. Silva, V. Lenzi, I. Fina, F. Sánchez, J. P. B. Silva, L. Marques, Influence of the parasitic m-phase and La doping on the polarization switching dynamics of epitaxial HfO2 thin film. E-MRS 2023 Fall Meeting, Warsaw, Poland 18-21 september 2023 (Oral presentation).

11. M. C. Istrate, R. F. Negrea, C. Ghica, J. P. B. Silva, “Study of the pure ZrO2 phases deposited on a Nb:SrTiO3 substrate with different orientations using TEM/HRTEM techniques”. E-MRS 2023 Fall Meeting, Warsaw, Poland 18-21 september 2023 (Oral presentation).

10. J. P. B. Silva, “Ferroelectric ZrO2 thin films”. Seminar to the Huawei I&D Department in Leuven and Beijing. 20 December 2023. Organized by Dr. Ming Jin, R&D Senior Engineer at Huawei Technologies Belgium Research Center (virtual).

09. M. C. Istrate, C. Ghica, J. P. B. Silva, “New deposition method for achieving ferroelectric orthorhombic ZrO2”, Conference of the Romanian Electron Microscopy Society - C.R.E.M.S., Cluj-Napoca, 18-21 October 2023. (Poster presentation).

08. Benoît Manchon, Greta Segantini, Pedro Rojo Romeo, Ingrid Canero Infante, Dominique Drouin, Bertrand Vilquin, Damien Deleruyelle. Study of Imprint Dynamics in HZO Ferroelectric Capacitors. Oral presentation at International Symposium on Applications of Ferroelectrics – ISAF 2023, Cleveland, USA (July 2023).

07. Jordan Bouaziz, Greta Segantini, Benoît Manchon, Ingrid Cañero Infante, Nicolas Baboux, Matthieu Bugnet, Pedro Rojo Romeo, D Deleruyelle, Bertrand Vilquin. Elaboration and imprint consideration in HfZrO2 ferroelectric capacitors. Oral presentation at Novel High-k Application Workshop 2023 in Dresden, Germany (May 2023).

06. A. Silva, I. Fina, F. Sánchez, J. P. B. Silva, L. Marques, V. Lenzi, Promising routes for achieving low coercive field in HfO2 thin films. Oral presentation at Novel High-k Application Workshop 2023 in Dresden, Germany (May 2023).

05. J. P. B. Silva, V. Lenzi, C. M. Istrate, C. Ghica, B. Šmíd, V. Matolín, L. S. Marques, J. L. MacManus-Driscoll, Ferroelectricity in epitaxial ZrO2 thin films, Oral presentation at COST action OPERA Workshop “Fundamental research – New Materials”, Madrid, Spain (April 2023).

04. Jordan Bouaziz, Greta Segantini, Benoît Manchon, Rabei Barhoumi, Ingrid Cañero Infante, Damien Deleruyelle, Nicolas Baboux, Pedro Rojo Romeo, Bertrand Vilquin. Engineering the nano and micro structures of sputtered HfZrO2 thin films. Oral presentation at 15th International Meeting on Ferroelectricity-IMF 2023, Tel-Aviv, Israel (March 2023).

03. V. Lenzi, J. P. B. Silva, L. Marques, Ferroelectric phases in epitaxial ZrO2 thin films achieved by substrate orientation control. E-MRS 2022 Fall Meeting in Warsaw, Poland (19–22 September 2022).
02. B. Vilquin, Influence of the electrode interface on the properties of ferroelectric HfZrO2. Oral presentation at Novel High-k Application Workshop 2022 in Dresden, Germany (12-13 September 2022).
01. J. P. B. Silva, Ferroelectric orthorhombic and rhombohedral phases in ZrO2 thin films. Oral presentation at Novel High-k Application Workshop 2022 in Dresden, Germany (12-13 September 2022).